Dewetting behavior of Au films on porous substrates
Creators
- 1. Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyeongbuk, 790784 (Korea, Republic of)
- 2. School of Physical Electronics, University of Electronic Science and Technology of China (UESTC), Chengdu, Sichuan, 610054 (China)
Description
Understanding the stability of thin films and their spontaneous pattern formation upon dewetting is essential to a host of physical phenomena. In this paper, we study the dewetting phenomena of Au thin films deposited on anodic aluminum oxide (AAO) membranes to analyze the stability of the metal film on porous substrates. AAO membranes, as-sputtered and dewetted Au films are all characterized by scanning electronic microscopy and X-ray diffraction. We found that both the roughness of AAO surface and modification of AAO pores exhibit remarkable influences on the dewetting behavior of Au films. The observed dewetting phenomena are explained from an energetic point of view since dewetting is a process of minimization of the system free energy.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2010.08.128Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2010.08.128;
- PII
- S0040-6090(10)01246-0;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 519
- Journal Issue
- 2
- Journal Page Range
- p. 706-713
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- Romanian conference on advanced materials 2009
- Acronym
- ROCAM 2009
- Dates
- 25-28 Aug 2009
- Place
- Brashov (Romania)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 42067266
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- AGGLOMERATION; ALUMINIUM OXIDES; ANNEALING; FREE ENERGY; MINIMIZATION; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SURFACES; THIN FILMS; X-RAY DIFFRACTION
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON MICROSCOPY; ENERGY; FILMS; HEAT TREATMENTS; MATERIALS; MICROSCOPY; OPTIMIZATION; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; THERMODYNAMIC PROPERTIES
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.