Published August 15, 2009 | Version v1
Journal article

Intensity distributions of enhanced H emission from laser-induced low-pressure He plasma and a suggested He-assisted excitation mechanism

  • 1. Research Center of Maju Makmur Mandiri Foundation, 40 Srengseng Raya, Kembangan, Jakarta Barat 11630 (Indonesia)
  • 2. Department of Chemistry, Faculty of Mathematics and Natural Sciences, Syiah Kuala University, Darussalam, Banda Aceh, Nanggroe Aceh Darussalam 23111 (Indonesia)
  • 3. Department of Physics, Faculty of Mathematics and Natural Sciences, Syiah Kuala University, Darussalam, Banda Aceh, Nanggroe Aceh Darussalam 23111 (Indonesia)
  • 4. Department of Physics, Faculty of Education and Regional Studies, Fukui University, 9-1 bunkyo 3-chome, Fukui 910-8507 (Japan)
  • 5. Physics of Magnetism and Photonics Group, Faculty of Mathematics and Natural Sciences, Bandung Institute of Technology, 10 Ganesha, Bandung 40132 (Indonesia)

Description

An experimental study was conducted on the spatial distributions of hydrogen emission intensities from low-pressure plasmas generated by laser ablation of zircaloy-4 and black stone targets in nitrogen and helium ambient gases. In addition to confirming the previously observed intensity enhancement effect in ambient helium gas, the hydrogen and helium emission intensities measured along the plasma expansion direction revealed remarkable extended spatial distributions featuring unexpected maxima near the far end of the plasma where the available shock-wave generated thermal excitation energy should have been significantly reduced. This 'anomalous' feature necessarily implied the presence of an additional excitation process beside the well known shock-wave excitation process which is responsible for the plasma emission of heavy atoms in low-pressure ambient gas. Further analysis of the data led to a suggested physical mechanism explaining the possible contribution of a helium metastable excited state to the unusual phenomenon observed in this experiment.

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
106
Journal Issue
4
Journal Page Range
p. 043303-043303.6
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2009 American Institute of Physics