Published December 2006 | Version v1
Journal article

Excitation process and photoluminescence properties of Tb3+ and Eu3+ ions in SnO2 and in SnO2: Porous silicon hosts

  • 1. Unite de recherche de Spectroscopie Raman, Departement de Physique, Faculte des Sciences de Tunis, Elmanr 2092, Tunis (Tunisia)
  • 2. Laboratoire de Physique de la Matiere Condensee et Nanostructures- (UMR CNRS 5586), Universite Claude Bernard Lyon 1, 69622 Villeurbanne Cedex (France)

Description

Tin oxide (SnO2)-layers-doped terbium and europium ions are elaborated by the sol-gel method on silicon substrates. After annealing at 500 deg. C, the transmission electron microscopy revealed a crystallization of tin oxide. The emission properties of rare-earth in SnO2 are studied systematically against temperature annealing and Tb3+ concentration. The PL spectrum is optimal after annealing at 900 deg. C and the corresponding photoluminescence (PL) decay is nearly exponential, showing that the sample is homogenous and the PL process can be described by two levels system. The concentration effect shows a quenching of the PL intensity for Tb3+ concentration above 4%. From the investigation of the decay rate from the 7F5 state within terbium concentration, we show that self-quenching is insured by dipole - dipole interaction. The evolutions of both PL intensity and PL lifetime versus temperature are studied. The PL intensity and PL lifetime are enhanced by deposing SnO2:Tb3+ and SnO2:Eu3+ in porous silicon. We show that an efficient excitation transfer from Si nanocrystallites to RE ions can occur

Additional details

Identifiers

DOI
10.1016/j.jlumin.2005.12.003;
PII
S0022-2313(05)00298-X;

Publishing Information

Journal Title
Journal of Luminescence
Journal Volume
121
Journal Issue
2
Journal Page Range
p. 507-516
ISSN
0022-2313
CODEN
JLUMA8

Conference

Title
Symposium D, Silicon-based photonics
Acronym
E-MRS 2006
Dates
29 May - 2 Jun 2006
Place
Nice (France)

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.