The response of a capacitively coupled discharge to the formation of dust particles: Experiments and modeling
Creators
- 1. Institute of Experimental Physics II, Ruhr-University Bochum, D-44780 Bochum (Germany)
- 2. Institute of Experimental Physics II, Ruhr-University Bochum, D-44780 Bochum, Germany and Institute of Physics, POB 57, 11001 Belgrade (Serbia and Montenegro)
- 3. School of Physics and Technology, V. N. Karazin Kharkiv National University, Svobody sq. 4, 61077 Kharkiv (Ukraine)
Description
The influence of dust particles on the properties of a capacitively coupled Ar-C2H2 discharge is studied both experimentally and theoretically. The results of measurements of the intensity and spatial distribution of the emitted light, the line width of the fast component of Hα line and of the electron density during the particle growth are presented. To analyze the experimental results a one-dimensional discharge model is developed. Using the model the effects of dust grains on the power absorption (taking into account stochastic and Ohmic heating in the plasma sheaths), the optical emission intensity profile, the sheath size, the rf electric field and on the energy of positive ions bombarding the electrodes are investigated. In particular, it is shown that the decrease of the power absorption in the sheaths of complex plasmas is due to the dependence of the stochastic and Ohmic heating in the plasma sheaths on the electron temperature and the current flowing across the discharge plates. The results of the calculations are compared with the available experimental data and found to be in good agreement
Additional details
Identifiers
- DOI
- 10.1063/1.2222258;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 13
- Journal Issue
- 7
- Journal Page Range
- p. 073507-073507.10
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38023115
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ABSORPTION; ACETYLENE; ARGON; CATIONS; COMPUTERIZED SIMULATION; DUSTS; ELECTRIC CURRENTS; ELECTRIC FIELDS; ELECTRODES; ELECTRON DENSITY; ELECTRON TEMPERATURE; EMISSION; HIGH-FREQUENCY DISCHARGES; ION TEMPERATURE; LINE WIDTHS; PLASMA; PLASMA DENSITY; PLASMA SHEATH; PLASMA SIMULATION; RADIATION TRANSPORT; SPATIAL DISTRIBUTION; VISIBLE RADIATION
- Descriptors DEC
- ALKYNES; CHARGED PARTICLES; CURRENTS; DISTRIBUTION; ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; HYDROCARBONS; IONS; NONMETALS; ORGANIC COMPOUNDS; RADIATIONS; RARE GASES; SIMULATION; SORPTION
Optional Information
- Notes
- (c) 2006 American Institute of Physics