Published 2000 | Version v1
Book

Atomic force microscopic study on etching property near the ion tracks in CR-39 plastic detector

  • 1. Department of Quantum Engineering and Systems Science, Univ. of Tokyo, Tokyo (Japan)
  • 2. National Institute of Radiological Sciences, Chiba (Japan)
  • 3. College of Industrial Technology, Nihon Univ., Narashino, Chiba (Japan)

Description

Very small etch pits on CR-39 plastic track detectors were measured with an AFM (Atomic Force Microscope) for protons and heliums with MeV order energies or less. Even in early stage of etching process, the diameter of etch pits increased with the stopping power of charged particles. The large deviation of the diameter of these etch pits is seem to have some informations on the track structure. (author)

Part of:
Proceedings of the first international symposium on supercritical water-cooled reactors, design and technology

Additional details

Publishing Information

Publisher
Tokyo Univ.
Imprint Place
Tokyo (Japan)
ISBN
4-901332-00-4
Imprint Title
Proceedings of the first international symposium on supercritical water-cooled reactors, design and technology
Imprint Pagination
296 p.
Journal Page Range
p. 294-296

Conference

Title
1. international symposium on supercritical water-cooled reactors, design and technology
Acronym
SCR-2000
Dates
6-9 Nov 2000
Place
Tokyo (Japan)

Optional Information

Notes
10 refs., 2 figs.