Published April 30, 2014 | Version v1
Journal article

Analysis for positions of Sn atoms in epitaxial Ge1−xSnx film in low temperature depositions

  • 1. Dept. of Comm. Eng., Okayama Pref. Univ., 111 Kuboki, Soja, Okayama 719-1197 (Japan)
  • 2. Dept. of Cryst. Mat. Sci., Grad. School of Eng., Nagoya Univ., Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
  • 3. Technology, GlobalWafers Japan Corp. Ltd, 6-861-5 Higashiko, Seiro, Niigata 957-0197 (Japan)

Description

We investigated the position of Sn atoms in Ge1−xSnx film grown at a low temperature by using the Extended X-ray Absorption Fine Structure (EXAFS) method. Vacancies had been expected to be introduced near the growing surface vicinity of a Sn atom and located at a split-vacancy position due to the binding nature between a Sn atom and a vacancy, which was predicted by the calculation for a bulk model in the literature. However, the EXAFS showed that almost all Sn atoms were located at the substitutional position and did not form a split-vacancy. - Highlights: • Extended X-ray Absorption Fine Structure (EXAFS) study of epitaxial Ge1−xSnx film • EXAFS shows that almost all Sn atoms are located at substitutional positions. • The amount of vacancies introduced in low-temperature epitaxial growth is small

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2013.10.070

Additional details

Identifiers

DOI
10.1016/j.tsf.2013.10.070;
PII
S0040-6090(13)01681-7;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
557
Journal Page Range
p. 173-176
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
8. international conference on silicon epitaxy and heterostructures; ISCSI-VI: 6. international symposium on control of semiconductor interfaces
Acronym
ICSI-8
Dates
2-6 Jun 2013
Place
Fukuoka (Japan)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47003468
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION; ABSORPTION SPECTROSCOPY; ATOMS; CONCENTRATION RATIO; DEPOSITION; EPITAXY; FINE STRUCTURE; GERMANIUM ALLOYS; SURFACES; TEMPERATURE DEPENDENCE; TIN; TIN ALLOYS; VACANCIES; X-RAY SPECTROSCOPY
Descriptors DEC
ALLOYS; CRYSTAL DEFECTS; CRYSTAL GROWTH METHODS; CRYSTAL STRUCTURE; DIMENSIONLESS NUMBERS; ELEMENTS; METALS; POINT DEFECTS; SORPTION; SPECTROSCOPY

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.