Analysis for positions of Sn atoms in epitaxial Ge1−xSnx film in low temperature depositions
Creators
- 1. Dept. of Comm. Eng., Okayama Pref. Univ., 111 Kuboki, Soja, Okayama 719-1197 (Japan)
- 2. Dept. of Cryst. Mat. Sci., Grad. School of Eng., Nagoya Univ., Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
- 3. Technology, GlobalWafers Japan Corp. Ltd, 6-861-5 Higashiko, Seiro, Niigata 957-0197 (Japan)
Description
We investigated the position of Sn atoms in Ge1−xSnx film grown at a low temperature by using the Extended X-ray Absorption Fine Structure (EXAFS) method. Vacancies had been expected to be introduced near the growing surface vicinity of a Sn atom and located at a split-vacancy position due to the binding nature between a Sn atom and a vacancy, which was predicted by the calculation for a bulk model in the literature. However, the EXAFS showed that almost all Sn atoms were located at the substitutional position and did not form a split-vacancy. - Highlights: • Extended X-ray Absorption Fine Structure (EXAFS) study of epitaxial Ge1−xSnx film • EXAFS shows that almost all Sn atoms are located at substitutional positions. • The amount of vacancies introduced in low-temperature epitaxial growth is small
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.10.070Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.10.070;
- PII
- S0040-6090(13)01681-7;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 557
- Journal Page Range
- p. 173-176
- ISSN
- 0040-6090
- CODEN
- THSFAP
Conference
- Title
- 8. international conference on silicon epitaxy and heterostructures; ISCSI-VI: 6. international symposium on control of semiconductor interfaces
- Acronym
- ICSI-8
- Dates
- 2-6 Jun 2013
- Place
- Fukuoka (Japan)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 47003468
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ABSORPTION; ABSORPTION SPECTROSCOPY; ATOMS; CONCENTRATION RATIO; DEPOSITION; EPITAXY; FINE STRUCTURE; GERMANIUM ALLOYS; SURFACES; TEMPERATURE DEPENDENCE; TIN; TIN ALLOYS; VACANCIES; X-RAY SPECTROSCOPY
- Descriptors DEC
- ALLOYS; CRYSTAL DEFECTS; CRYSTAL GROWTH METHODS; CRYSTAL STRUCTURE; DIMENSIONLESS NUMBERS; ELEMENTS; METALS; POINT DEFECTS; SORPTION; SPECTROSCOPY
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.