In-depth concentration distribution of Ar in Si surface after low-energy Ar+ ion sputtering

The in-depth concentration of Ar atoms in Si surface after Ar+ ion sputtering was investigated using medium-energy ion spectroscopy (MEIS) and dynamic Monte Carlo simulation. The primary Ar+ ion energy was 0.5, 1 and 3 keV, and the primary Ar+ ion beam direction was varied from surface normal to glancing angle. In the case of the surface normal incidence, the MEIS result shows that the maximum atomic concentration of Ar atoms increases from 6% at the depth of 2 nm to 16% at the depth of 3 nm as the primary ion energy increases from 0.5 to 3 keV. However, in the case of the incident angle of 80 deg., that is 2.5% at the depth of 1.5 nm when the primary energy is 3 keV, in-depth Ar distribution cannot be observable when the primary ion energy is 0.5 keV. Dynamic Monte Carlo simulation reproduced the in-depth concentration distribution of Ar atoms quantitatively