Published 1993 | Version v1
Book

Experimental studies on x-ray and ion beam emitted from a small gas-puff Z-pinch plasma device

  • 1. Tsinghua Univ., Beijing (China). Gas Discharge and Plasma Lab.

Description

Experimental studies of x-ray emission and energy spectra of ion beams have been respectively conducted on a small gas-puff Z-pinch plasma device (ZP). The ZP consists of a capacitor bank and a discharge chamber, which includes a fast gas valve, an ultrasonic nozzle and a pair of electrodes. The capacitor bank has the following parameters: capacitance 16.3 uF; inductance 142 uH; charged voltage 23 kV 1/4 period 2.4 us; peak current 250 kA. The effects on the x-ray yield due to nozzle configuration, gas filling pressure, charged voltage of capacitor bank and pinch current has been respectively investigated. The different nozzles with orifice of 10, 3 and 1 mm have been respectively used to produce hollow gas shell of different thickness in the region between the electrodes. A thinner puffed gas shell usually produces higher x-ray yield. PIN has been used to measure the time variation of x-ray source. The pulse width of PIN output increases linearly with the charged voltage of capacitor bank. The relation between X-Ray yield Y and pinch current Ip is approximately Y∼Ip9. The pinhole camera pictures of the x-ray source at the axial and radial direction have been obtained. In addition to strong soft x-ray pulse, a strong charged particle beam (ion beam) is simultaneously produced. Such ion beam usually reduces the quality of the x-ray for application. In order to improve the quality of x-ray the authors have, using a compact Thomson analyzer, studied the energy spectra, ion species and charge state of the ion beam. The analyzer has a small size and soft iron shield case to reduce electromagnetic interference from high current discharge. The integration constants of magnetic and electric fields of the analyzer are 0.12 T-m and 2.52 x 104 V respectively. The analyzer is installed on the axis of the electrodes

Part of:
IEEE International conference on plasma science: Conference record--Abstracts

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (United States)
Imprint Title
IEEE International conference on plasma science: Conference record--Abstracts
Imprint Pagination
250 p.
Journal Page Range
p. 132.

Conference

Title
20. IEEE international conference on plasma sciences.
Dates
7-9 Jun 1993.
Place
Vancouver (Canada).

Optional Information

Secondary number(s)
CONF-930652--.