Experimental studies on x-ray and ion beam emitted from a small gas-puff Z-pinch plasma device
Creators
- 1. Tsinghua Univ., Beijing (China). Gas Discharge and Plasma Lab.
Description
Experimental studies of x-ray emission and energy spectra of ion beams have been respectively conducted on a small gas-puff Z-pinch plasma device (ZP). The ZP consists of a capacitor bank and a discharge chamber, which includes a fast gas valve, an ultrasonic nozzle and a pair of electrodes. The capacitor bank has the following parameters: capacitance 16.3 uF; inductance 142 uH; charged voltage 23 kV 1/4 period 2.4 us; peak current 250 kA. The effects on the x-ray yield due to nozzle configuration, gas filling pressure, charged voltage of capacitor bank and pinch current has been respectively investigated. The different nozzles with orifice of 10, 3 and 1 mm have been respectively used to produce hollow gas shell of different thickness in the region between the electrodes. A thinner puffed gas shell usually produces higher x-ray yield. PIN has been used to measure the time variation of x-ray source. The pulse width of PIN output increases linearly with the charged voltage of capacitor bank. The relation between X-Ray yield Y and pinch current Ip is approximately Y∼Ip9. The pinhole camera pictures of the x-ray source at the axial and radial direction have been obtained. In addition to strong soft x-ray pulse, a strong charged particle beam (ion beam) is simultaneously produced. Such ion beam usually reduces the quality of the x-ray for application. In order to improve the quality of x-ray the authors have, using a compact Thomson analyzer, studied the energy spectra, ion species and charge state of the ion beam. The analyzer has a small size and soft iron shield case to reduce electromagnetic interference from high current discharge. The integration constants of magnetic and electric fields of the analyzer are 0.12 T-m and 2.52 x 104 V respectively. The analyzer is installed on the axis of the electrodes
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (United States)
- Imprint Title
- IEEE International conference on plasma science: Conference record--Abstracts
- Imprint Pagination
- 250 p.
- Journal Page Range
- p. 132.
Conference
- Title
- 20. IEEE international conference on plasma sciences.
- Dates
- 7-9 Jun 1993.
- Place
- Vancouver (Canada).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 25014991
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CAPACITORS; DESIGN; ENERGY SPECTRA; ION BEAMS; LINEAR Z PINCH DEVICES; PERFORMANCE; PLASMA; X RADIATION; X-RAY SOURCES
- Descriptors DEC
- BEAMS; ELECTRICAL EQUIPMENT; ELECTROMAGNETIC RADIATION; ENERGY STORAGE SYSTEMS; EQUIPMENT; IONIZING RADIATIONS; LINEAR PINCH DEVICES; OPEN PLASMA DEVICES; PINCH DEVICES; RADIATION SOURCES; RADIATIONS; SPECTRA; THERMONUCLEAR DEVICES
Optional Information
- Secondary number(s)
- CONF-930652--.