Effect of heat treatment temperature on the microstructure and actuation behavior of a Ti-Ni-Cu thin film microactuator
- 1. Biomaterials Center, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044 (Japan)
- 2. Institute of Materials Science, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)
- 3. International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Ibaraki 305-0044 (Japan)
Description
Ti-Ni-Cu/SiO2 two layer diaphragm-type microactuators were fabricated by sputter deposition and micromachining. The influence of heat treatment temperature on the actuation behavior was investigated under quasi-static conditions. The interfacial structure of Ti-Ni-Cu/SiO2 and internal structure of the Ti-Ni-Cu layer were also investigated using transmission electron microscopy. The reaction layer formed between the Ti-Ni-Cu and SiO2 layers, and preferentially grew into the SiO2 side. The reaction layer formed at 1023 K mainly consisted of Ti4(Ni,Cu)2O. The maximum height of the diaphragm decreased with increasing heat treatment temperature. The growth of the reaction layer also affected the microstructure of the Ti-Ni-Cu layer. The density of fine platelets and Ti2Ni precipitates decreased with increasing heat treatment temperature from 873 to 923 K, and they disappeared at 973 K due to the fact that the reaction layer mainly consisted of a Ti-rich phase. The microactuator heat treated at 973 K showed the highest transformation temperature with the lowest transformation temperature hysteresis, which is attractive for high speed actuation.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.actamat.2010.07.024Additional details
Identifiers
- DOI
- 10.1016/j.actamat.2010.07.024;
- PII
- S1359-6454(10)00458-1;
Publishing Information
- Journal Title
- Acta Materialia
- Journal Volume
- 58
- Journal Issue
- 18
- Journal Page Range
- p. 6064-6071
- ISSN
- 1359-6454
- CODEN
- ACMAFD
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43039399
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- AUGMENTATION; DEPOSITION; HEAT TREATMENTS; HYSTERESIS; LAYERS; MICROSTRUCTURE; PRECIPITATION; SHAPE MEMORY EFFECT; SILICA; SILICON OXIDES; SPUTTERING; THIN FILMS; TRANSFORMATIONS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- CHALCOGENIDES; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; SEPARATION PROCESSES; SILICON COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2010 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.