Published 1986
| Version v1
Book
Two dimensional features of virtual cathode and microwave emission
Description
A two dimensional model for the electron flow in the presence of a virtual cathode is presented. The model allows for electron reflexing and velocity distribution spread. Solutions with large radial flow agree closely with high-power microwave emission, and predict the microwave frequency scaling linearly with diode current. The radial motion is due to beam pinching, which reduces loss of electrons to the side walls and causes reflexing between real and virtual cathodes. Scaling laws are obtained which agree with experimental measurements
Additional details
Publishing Information
- Publisher
- IEEE Service Center.
- Imprint Place
- Piscataway, NJ (USA)
- Imprint Title
- Conference record of the 1986 IEEE international conference on plasma science
- Journal Page Range
- p. 55.
Conference
- Title
- 13. IEEE international conference on plasma science.
- Dates
- 19-21 May 1986.
- Place
- Saskatoon, Saskatchewan (Canada).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 18028981
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CATHODES; ELECTRONS; GAS FLOW; MATHEMATICAL MODELS; MICROWAVE AMPLIFIERS; POWER LOSSES; SCALING LAWS; SPECIFICATIONS
- Descriptors DEC
- AMPLIFIERS; ELECTRODES; ELECTRONIC EQUIPMENT; ELEMENTARY PARTICLES; EQUIPMENT; FERMIONS; FLUID FLOW; LEPTONS; MICROWAVE EQUIPMENT