Published 1993 | Version v1
Book

Fullerene field-effect transistors

  • 1. Ludwig-Boltzmann Inst. fuer Festkoerperphysik, Wien (Austria)
  • 2. Inst. fuer Festkoerperphysik, Wien Univ. (Austria)
  • 3. Semiconductor Lab., Technical Research Centre of Finland, Espoo (Finland)

Description

Undoped C60 and C60/C70 fullerenes have been used as the active material in thin-film field-effect transistors (FET). All FET's turned out to be n-channel devices operating in the accumulation mode with a field-effect mobility around 10-4 cm2/Vs. The conductance-activation energy is a function of the gate voltage. Like in amorphous silicon localized states have a strong influence on the transport properties. These localized states can either originate from disorder or from a self-trapping of the induced carriers in the fullerene. (orig.)

Part of:
Electronic properties of high-Tc superconductors. The normal and the superconducting state of high-Tc materials. Proceedings

Additional details

Publishing Information

Publisher
Springer.
Imprint Place
Berlin (Germany)
ISBN
3-540-56195-1
Imprint Title
Electronic properties of high-Tc superconductors. The normal and the superconducting state of high-Tc materials. Proceedings
Imprint Pagination
542 p.
Journal Volume
113
Series
Springer series in solid-state sciences.
Journal Page Range
p. 512-515.

Conference

Title
The normal and the superconducting state of high Tc materials.
Acronym
International winterschool on electronic properties of high temperature superconductors (IWEPS '92)
Dates
7-14 Mar 1992.
Place
Kirchberg, Tirol (Austria).

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
24046827
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
AMORPHOUS STATE; CARBON; EXCITONS; FIELD EFFECT TRANSISTORS; FULLERENES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; TRAPPING
Descriptors DEC
ELEMENTS; FILMS; NONMETALS; QUASI PARTICLES; SEMICONDUCTOR DEVICES; TEMPERATURE RANGE; TRANSISTORS

Optional Information