Recycling processing method for radioactive liquid waste containing sodium nitrate
Description
Nitric acid is recovered by reacting sulfuric acid to low and medium level radioactive liquid wastes containing Na nitrate in a glass-lined reaction vessel and by heating under reduced pressure. Sodium hydrogen sulfate Na as a reaction product is neutralized into Na sulfate and then electrolyzed, and resultant Na hydroxide is recovered. On the other hand, sulfuric acid is recycled so as to be used again for the reaction with radioactive liquid wastes containing Na nitrate, and residual liquid of electrolysis is recycled and electrolyzed. Then, miscellaneous materials accumulated in the system are separated and removed by a chelate resin method. With such procedures, nitric acid can be recovered with no influences on anodic corrosion in an electrolysis bath, thereby enabling to prolong the life time of the equipments and improve process reliability. (T.M.)
Availability note (English)
Available from JAPIO. Also available from EPO.Additional details
Publishing Information
- Imprint Pagination
- 5 p.
- IPC:
- Int. Cl. G21F9/06; C02F9/00.
- IPC
- Int. Cl. G21F9/06; C02F9/00.
- Patent number
- JP patent document 6-242294/A/
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 26042049
- Subject category
- S12: MANAGEMENT OF RADIOACTIVE WASTES, AND NON-RADIOACTIVE WASTES FROM NUCLEAR FACILITIES;
- Resource subtype / Literary indicator
- Non-conventional Literature
- Descriptors DEI
- CHELATES; CYCLIZATION; ELECTROLYSIS; IMPURITIES; LIQUID WASTES; RADIOACTIVE WASTE PROCESSING; RESINS; SEPARATION PROCESSES; SODIUM HYDROXIDES; SODIUM NITRATES; SULFURIC ACID
- Descriptors DEC
- ALKALI METAL COMPOUNDS; CHEMICAL REACTIONS; COMPLEXES; HYDROGEN COMPOUNDS; HYDROXIDES; INORGANIC ACIDS; INORGANIC COMPOUNDS; MANAGEMENT; NITRATES; NITROGEN COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC POLYMERS; OXYGEN COMPOUNDS; POLYMERS; SODIUM COMPOUNDS; SULFUR COMPOUNDS; WASTE MANAGEMENT; WASTE PROCESSING; WASTES
Optional Information
- Secondary number(s)
- JP patent application 5-54860.