Published 1990
| Version v1
Journal article
On the use of H+ and Ar+ ions for high spatial resolution depth profiling
- 1. FOM-Instituut voor Atoom-en Molecuulfysica, Amsterdam (Netherlands)
- 2. Associatie Euratom-FOM, Nieuwegein (Netherlands). FOM-Instituut voor Plasmafysica
Description
We report on the destructive sputtering of Ni-C multilayer coatings which have a periodicity of 2.7 nm, using H+ as well as Ar+ ions of 750 eV energy. The influence of ion bombardment on interface roughness, interface mixing and density has been investigated by monitoring this process in situ using a soft X-ray reflection system. Ion bombardment has been demonstrated to decrease the roughness of a sputtered surface while a considerable intermixing of the interface below the sputtered layer occurs. Changes in the film density have not been observed. (author)
Additional details
Publishing Information
- Journal Title
- Vacuum
- Journal Volume
- 41
- Journal Issue
- 4-6
- Series
- Vacuum.
- Journal Page Range
- 1327-1329
- ISSN
- 0042-207X
- CODEN
- VACUA
Conference
- Title
- 11. international vacuum congress (IVC-11); 7. international conference on solid surfaces (ICSS-7).
- Dates
- 25-29 Sep 1989.
- Place
- Cologne (Germany, F.R.).
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- United Kingdom
- INIS RN
- 22013882
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ARGON IONS; CARBON; CHEMICAL COMPOSITION; COATINGS; DENSITY; DEPTH; HYDROGEN IONS; ION BEAMS; LAYERS; MILLING; MIXING; NICKEL; ROUGHNESS; SPATIAL RESOLUTION; SPUTTERING
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; DIMENSIONS; ELEMENTS; IONS; MACHINING; METALS; NONMETALS; PHYSICAL PROPERTIES; RESOLUTION; SURFACE PROPERTIES; TRANSITION ELEMENTS