Published November 1, 2005 | Version v1
Journal article

Electrical characteristics of heavily doped NTD Ge at very low temperatures

  • 1. Department of Physics, University of Florence, Florence (Italy)
  • 2. INFN, Section of Florence, Florence (Italy)
  • 3. Lawrence Berkeley National Laboratory, University of California, Berkeley (United States)
  • 4. Department of Mechanics, University of Florence, Florence (Italy)
  • 5. INFN, Section of Florence, Florence (Italy) and Department of Physics, University of Florence, Florence (Italy)

Description

We report about the measurement of the electric characteristics of some NTD Ge thermistors at temperatures down to 25mK. The dopant concentration is around 6x1016cm-3, producing a material of characteristics close to the metal-to-insulator transition. Fitting the ρ(T) characteristics with a variable exponent p Mott's law, a p around 0.6 was obtained. This result confirms the hypothesis of a dependence of p on the doping level

Additional details

Identifiers

DOI
10.1016/j.physb.2005.07.008;
PII
S0921-4526(05)00882-3;

Publishing Information

Journal Title
Physica. B, Condensed Matter
Journal Volume
368
Journal Issue
1-4
Journal Page Range
p. 139-142
ISSN
0921-4526
CODEN
PHYBE3

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37068344
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
CRYOGENICS; DOPED MATERIALS; ELECTRIC CONDUCTIVITY; GERMANIUM; PHASE TRANSFORMATIONS; SEMICONDUCTOR MATERIALS; TEMPERATURE DEPENDENCE; THERMISTORS
Descriptors DEC
ELECTRICAL PROPERTIES; ELEMENTS; MATERIALS; METALS; PHYSICAL PROPERTIES; SEMICONDUCTOR DEVICES

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.