Published May 2005 | Version v1
Journal article

Thermal expansion anisotropy and site occupation of the pseudo-binary molybdenum vanadium silicide Mo5Si3-V5Si3

  • 1. Metals and Ceramics Division, Oak Ridge National Laboratory, Oak Ridge, P.O. Box 2008, TN 37831 6064 (United States)

Description

The coefficients of thermal expansion (CTEs) and atomic site occupation factors were measured for the pseudo-binary molybdenum-vanadium silicide Mo5Si3-V5Si3. The ratios of the CTEs in the crystallographic c and a directions range from 2.0 for Mo5Si3 to 1.2 for Mo2V3Si3. The metal atoms can occupy chain sites (in the crystallographic c-direction), and non-chain sites. The relatively small V atoms prefer the chain sites in Mo5Si3, whereas the relatively large Mo atoms prefer the non-chain sites in V5Si3. These site-occupation characteristics reduce the thermal expansion in the c-direction and thereby the CTE anisotropy. Ab initio calculations for Mo4VSi3 suggest that, energetically, V prefers the chain sites, while the measurements show that V occupies also non-chain sites. Extrapolation of the experimental results assuming the site-occupation used in the calculations agrees with the theoretical result that the thermal expansion of Mo4VSi3 is isotropic

Additional details

Identifiers

DOI
10.1016/j.actamat.2005.02.005;
PII
S1359-6454(05)00081-9;

Publishing Information

Journal Title
Acta Materialia
Journal Volume
53
Journal Issue
8
Journal Page Range
p. 2431-2437
ISSN
1359-6454
CODEN
ACMAFD

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.