Published June 1991
| Version v1
Journal article
Plasma source ion implantation (PSII) in a magnetic well configuration
- 1. Southwest Inst. of Physics, Leshan, SC (China)
Description
A rotational plasma technique was used for investigating ion implantation of material. In the process of PSII, targets were immersed in a plasma and were DC-biased to high negative volage (22 kV in the experiments). The mechanism related to this technique and experimental results are presented
Additional details
Publishing Information
- Journal Title
- Nuclear Fusion and Plasma Physics
- Journal Volume
- 11
- Journal Issue
- 2
- Series
- Nucl. Fusion Plasma Phys.
- Journal Page Range
- 106-110
- ISSN
- 0254-6086
- CODEN
- HYDWD
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 23033611
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- ION IMPLANTATION; MINIMUM-B CONFIGURATIONS; PLASMA SHEATH; PLASMATRONS; RELAXATION TIME; ROTATING PLASMA; THERMONUCLEAR REACTIONS
- Descriptors DEC
- ELECTRON TUBES; MAGNETIC FIELD CONFIGURATIONS; NUCLEAR REACTIONS; NUCLEOSYNTHESIS; OPEN CONFIGURATIONS; PLASMA; SYNTHESIS