Transistor challenges - A DRAM perspective
Creators
- 1. Infineon Technologies Dresden, P.O. Box 10 09 40, D-01076 Dresden (Germany)
Description
Key challenges of the transistor scaling from a DRAM perspective will be reviewed. Both, array transistors as well as DRAM support devices face challenges that differ essentially from high performance logic device scaling. As a major difference, retention time and standby current requirements characterize special boundary conditions in the DRAM device design. Array device scaling is determined by a chip size driven aggressive node scaling. To continue scaling, major innovations need to be introduced into state-of-the-art planar array transistors. Alternatively, non planar device concepts will have to be evaluated. Support device design for DRAMs is driven by today's market demand for increased chip performances at little to no extra cost. Major innovations are required to continue that path. Besides this strive for performance increase, special limitations for 'on pitch' circuits at the array edge will come up due to the aggressive cell size scaling
Additional details
Identifiers
- DOI
- 10.1016/j.nimb.2004.12.140;
- PII
- S0168-583X(05)00677-4;
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 237
- Journal Issue
- 1-2
- Journal Page Range
- p. 228-234
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 15. international conference on ion implantation technology
- Dates
- 25-27 Oct 2004
- Place
- Taipei, Taiwan (China)
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 37022891
- Subject category
- S46: INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- DESIGN; EQUIPMENT; ION IMPLANTATION; PERFORMANCE; SCALING; TRANSISTORS
- Descriptors DEC
- SEMICONDUCTOR DEVICES
Optional Information
- Copyright
- Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.