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[en] We report on the infrared spectroscopic studies of the normal-state electronic response of rare-earth ternary platinum germanide superconductor La_2Pt_3Ge_5. We analyzed the temperature-dependent optical conductivity spectra using the Drude-Lorentz oscillator model. We found that the two Drude responses with distinct scattering rates are required to explain the charge dynamics at 10 K while a single Drude mode could reproduce the far-infrared conductivity at higher temperatures. Our results indicated the two-band character of the electronic structure and highlighted the disparate temperature evolution of the electrodynamics of the two electronic states
[en] Electron structure transformation under irreversible α→β polymorphous transitions under high pressure in molybdenum and tungsten digermanides is investigated by X-ray spectral and X-ray electron methods. It is shown that after α→WGe2→βWGe2 phase transition the hybride Wd+GeP-states grow above the Fermi level by increasing their energy and transfer to the free state zone. The change of charge state of nuclei after completion of α→β polymorphous transformations in MoGe2 and WGe2 is evaluated
[en] The mode of a novel SiGe-OI optical waveguide is analyzed, and its single-mode conditions are derived. The Ge content and structure parameters of SiGe-OI optical waveguides are respectively optimized. Under an operation wavelength of 1300 nm, the structures of SiGe-OI rib optical waveguides are built and analyzed with Optiwave software, and the optical field and transmission losses of the SiGe-OI rib optical waveguides are analyzed. The optimization results show that when the structure parameters H, h, W are respectively 500 nm, 250 nm, 500 nm and the Ge content is 5%, the total power loss of SiGe-OI rib waveguides is 0.3683 dB/cm considering the loss of radiation outside the waveguides and materials, which is less than the traditional value of 0.5 dB/cm. The analytical technique for SiGe-OI optical waveguides and structure parameters computed by this paper are proved to be accurate and computationally efficient compared with the beam propagation method (BPM) and the experimental results. (semiconductor devices)
[en] In this work, a novel three-layer SiGe strain relaxed buffer/strained Si0.5Ge0.5 layer stacking structure is systematically investigated. The novel three-layer graded SiGe strain relaxed buffer, whose Ge concentration increased from bottom to top by roughly 10% with an in situ annealing after each layer grown, can effectively constrain the threading dislocation in the strain relaxed buffer layer. Moreover, a chemical mechanical planarization process can be applied to the strain relaxed buffer to further improve its surface roughness. A high crystal quality and atomically smooth surface Si0.5Ge0.5 layer can be successfully realized on the novel chemical mechanical planarization-treated three-layer SiGe strain relaxed buffer. This strategy can attain at least 50 nm and 0.6% compressive strained Si0.5Ge0.5 layer and its quantification of the strain level is confirmed by utilizing the scanning moiré fringe imaging technique. It can be seen that this novel structure can provide a better mobility and larger width for the FinFET or nanowire SiGe channel device.