[en] Procedures are described for electrodeposition of bright, well-adhered elemental target layers of platinum and osmium approximately 1 - 2 mg cm^-2 thick on substrates of Fe, Co, Cu, and Ag

[en] Data on electrodeposition of rare and noble metals including Zr, Nb, Ta, Ti, W, Mo, In, Ru, Re are presented. Particularities of these processes are noted, electrolytes used in the processes are considered. The review also contains the information on application and prospects of obtained metallic coatings

[en] A simple method was used to design and set up an electrodeposition device for the alpha-emitting nuclides. The designed electroplating facility is leak proof and simple in operation and dismantled. The effect of current, pH of electrolyte, and the plating time on the electrodeposition efficiency have been investigated in a sodium bisulphate, sulphuric acid electrolyte in order to determine the optimum conditions. It was shown that a current of 900-1000 mA, plating time of 80-90 minutes and pH range of 2-2.3 are the best conditions for deposition of nano-scale uranium and plutonium. In these circumstances, it was possible to deposit 0.004 ng x g^-1 Pu and 60 ng x g^-1 U in an electroplating planchette. The device and modified procedures were successfully applied for soil samples. Prior to electrodeposition of the elements, a column extraction chromatography has been used to separate the Pu and U and eliminate most matrix and interferences in environmental samples. (author)

[en] The goal of this project was to develop a process to fabricate pure, dense, coherent boron coatings 1 mm thick on graphite or copper substrates. Electrodeposition from molten fluoride salts was the technique chosen for development. The investigation was begun by making a thorough search of the relevant literature and consulting with workers active in the field or related fields. As a result of this search, the technique selected from the literature was a process whereby boron is electrodeposited from a molten equimolal mixture of potassium and lithium fluorides containing dissolved boron trifluoride gas. Initial tests at Bendix consisted of a material evaluation study of 0.02-mm-thick, boron-coated copper specimens. The properties of the boron deposit determined from this material evaluation study were such that an apparatus was designed, constructed, and tested at Bendix Kansas City

[en] Determined are regularities of effect of electrolysis regime and electrode surface state on W electrodeposition, measured are contact potential difference (CPD) and the results of layer-by-layer analysis of deposits. It is established that there is a correlation between W ion electrochemical behaviour and CPD value. Conclusion is made that H atoms play determining role in obtaining highly reduced W forms

[en] Kinetics of electrochemical precipitation of molybdenum carbide on the surface of electroconducting abrasive materials by eleljctrolysis of ionic melts as dependent on temperature, cathode density of current and duration of the process is studied as well as correlation of these parameters with properties of metallized materials. Electrochemical metallization of silicon and boron carbides promotes an increase of the breaking load of abrasive grains and an excess of their wettability

[en] The investigations have been carried out which make it possible to reveal some regularities of tantalum electrocrystallization from molten salts. The degree of electrode polarization is found to have a predominant effect on the structure of cathode precipitate. Polarization degree in its turn, depends on cathode current density, temperature, electrolyte composition and quantitative interrelation of its constituents, electrolyte and initial metal purity, the content of oxygen-containing ions etc. The cathode precipitate of desired structure may be produced though controlling above mentioned parameters. The precipitates may be obtained in different forms - from dense coatings to fine dispersed powders (40-60 μm)

[en] Zinc-68 electrodeposition on a copper substrate was investigated for the production of ⁶⁴Cu radionuclide. The electrodeposition experiments were carried out by acid plating baths. Operating parameters such as pH, temperature, and current density are also optimized. The current efficiency was measured at different current densities. The optimum conditions of the zinc electrodeposition were as follows: 6.2 g/l zinc, pH = 3, dc current density of ca. 85.54 mA/cm² at 30^oC with 98% current efficiency. SEM photomicrographs demonstrated fine-grained structure of the deposit obtained from the optimum bath. (authors)

[en] Short communication

[en] Cu samples obtained in Cu(I) cyanide solution without or with an accelerating agent - selenium urea at 20 and 40^oC and different E_c were investigated using a transmission electron microscope (by the method of Pd shadowed C replicas), an electronograph (by the method of reflection), an electron probe microanalyser and a radiotracer technique wit K¹⁴CN. The size of Cu crystallites and crystalline aggregates decreases under the influence of selenium urea, especially at 40^oC. The correlation between accelerating action of this additive at i_c≥i_lim , chemical composition and surface layer structure of Cu deposits has been found. The influence of selenium urea on the structure of Cu deposits has been evaluated. (author). 8 figs., 1 tab., 17 refs