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AbstractAbstract
[en] Si/Gd multilayers designed as narrowband reflective coatings near 63 nm were developed. The highest peak reflectance of 26.2% at a 5 incident angle was obtained at 62 nm, and the spectral bandwidth was 7.3 nm FWHM. The fits for x-ray and extreme ultraviolet reflectance data of Si/Gd multilayers indicate the possibility of silicide formation at the Si-Gd interfaces. B4C, W, and SiN were deposited as interface barrier layers to improve the reflectance of Si/Gd multilayers. More than an 8% increase in reflectance was observed from the interface-engineered Si/W/Gd and Si/B4C/Gd multilayers.
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BNL--82931-2009-JA; AC02-98CH10886
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Journal Article
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Mochan, L.; Barrera, R.G.
Centro Latino Americano de Fisica (CLAF), Rio de Janeiro, RJ (Brazil)1980
Centro Latino Americano de Fisica (CLAF), Rio de Janeiro, RJ (Brazil)1980
AbstractAbstract
[en] Published in summary form only
Original Title
Propriedades opticas de sistemas cuasi-bidemensionales
Source
1980; 1 p; Latin American Colloquium on Surface Physics; Niteroi, RJ (Brazil); 1 Dec 1980
Record Type
Miscellaneous
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Conference
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Tench, R.J.; Kozlowski, M.R.; Chow, R.
Lawrence Livermore National Lab., CA (United States). Funding organisation: USDOE, Washington, DC (United States)1994
Lawrence Livermore National Lab., CA (United States). Funding organisation: USDOE, Washington, DC (United States)1994
AbstractAbstract
[en] A correlation between laser-induced damage and the height of a coating defect was found from an examination of HfO2/SiO2 mirrors made by three different coating vendors. The nodular defects in these reactive e-beam deposited mirrors were studied using the combination of SEM, optical microscopy, FIB and AFM techniques. Each vendor had small defects in common, but characteristically different large defects. Also the majority of seeds that caused the defects were made of hafnia, not silica. The apparent mechanical stability of the defects within the coating plays a major role in the laser resistance (1064 nm and l0ns) of a high damage threshold coating
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Jul 1994; 9 p; Annual meeting of the Society of Photo-Optical Instrumentation Engineers; San Diego, CA (United States); 24-29 Jul 1994; CONF-940723--18; CONTRACT W-7405-ENG-48; Also available from OSTI as DE94017695; NTIS; US Govt. Printing Office Dep
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Report
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Barrera, R.G.; Bagchi, A.
Centro Latino Americano de Fisica (CLAF), Rio de Janeiro, RJ (Brazil)1980
Centro Latino Americano de Fisica (CLAF), Rio de Janeiro, RJ (Brazil)1980
AbstractAbstract
[en] Published in summary form only
Original Title
Efectos del campo local en la reflectancia de monocapas adsorbidas sobre sustratos con dispersion espacial
Source
1980; 1 p; Latin American Colloquium on Surface Physics; Niteroi, RJ (Brazil); 1 Dec 1980
Record Type
Miscellaneous
Literature Type
Conference
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Reference NumberReference Number
INIS VolumeINIS Volume
INIS IssueINIS Issue
Wedowski, Marco; Gullikson, Eric M.; Underwood, James H.; Spiller, Eberhard A.; Montcalm, Claude; Kearney, Patrick; Bajt, Sasa; Schmidt, M.A.; Folta, J.A.
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States). Funding organisation: US Department of Energy (United States)2000
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States). Funding organisation: US Department of Energy (United States)2000
AbstractAbstract
No abstract available
Source
1 Oct 2000; [vp.]; 11. U.S. National Synchrotron Radiation Instrumentation Conference (SRI 1999); Stanford, CA (United States); 13-15 Oct 1999; AC03-76SF00098; Available from www.als.lbl.gov
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Syed, Mohd Amir; Pütter, Sabine; Mattauch, Stefan; Weber, Alexander; Koutsioubas, Alexandros; Schneider, Harald; Brückel, Thomas, E-mail: a.syed.mohd@fz-juelich.de
Proceedings of the seventeenth international conference on thin films: abstracts2017
Proceedings of the seventeenth international conference on thin films: abstracts2017
AbstractAbstract
[en] In this work Co thin films were deposited using MBE at room temperature and transported to MARIA reflectometer for PNR measurements without breaking vacuum with the help of UHV portable transfer chamber. Data evaluation of the PNR curves shows that surface of Co film is free from contamination. After the PNR measurements in UHV conditions, the sample was exposed to air and ex-situ PNR measurement was performed on the same sample. The comparison of quasi in-situ and ex-situ PNR measurements proves that our portable transfer chamber can be successfully used for PNR measurements of air sensitive thin films in UHV conditions. Booking of the access to the MBE system as well as the transport chamber is possible via the MLZ user office system in combination with an application for a beam time at neutron instruments like MARIA
Source
CSIR-National Physical Laboratory, New Delhi (India); Indian Vacuum Society, Mumbai (India); 236 p; 2017; p. 33; ICTF-2017: 17. international conference on thin films; New Delhi (India); 13-17 Nov 2017
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Book
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Burkhart, S.; Cerjan, C.; Kearney, P.; Mirkarimi, P.; Walton, C.; Ray-Chaudhuri, A.
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States). Funding organisation: US Department of Energy (United States)1999
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States). Funding organisation: US Department of Energy (United States)1999
AbstractAbstract
No abstract available
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Secondary Subject
Source
1 Mar 1999; [vp.]; 24. SPIE International Society for Optical Engineering; Santa Clara, CA (United States); 14-19 Mar 1999; AC03-76SF00098; Available from (additional information): www.als.lbl.gov/
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Report
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Wedowski, Marco; Bajt, Sasa; Folta, J.A.; Kearney, P.A.; Montcalm, Claude; Spiller, Eberhard A.; Gullikson, Eric M.; Underwood, James H.
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States). Funding organisation: US Department of Energy (United States)2000
Ernest Orlando Lawrence Berkeley National Lab., Advanced Light Source, Berkeley, CA (United States). Funding organisation: US Department of Energy (United States)2000
AbstractAbstract
No abstract available
Primary Subject
Source
1 Feb 2000; [vp.]; SPIE Conference; Santa Clara, CA (United States); 27 Feb - 2 Mar 2000; AC03-76SF00098; Available from www.als.lbl.gov
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AbstractAbstract
[en] The properties of axisymmetric and cylindrical optical concentrations in the wavelength region where all the substances possess low reflectivity are considered. The losses related to radiation leaving the system through side faces and reflective walls are found, and the ultimate efficiency of the concentrator is determined. On the basis of available data on optical constants the dependence of the efficiency on the choice of the reflective coating material is analyzed. The role of the roughness of the reflective surface is discussed and the principal requirements on the accuracy of concentrator fabrication are stated
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AbstractAbstract
[en] Conditions are investigated for initiation of nonreflecting absorption of electromagnetic radiation in a polar dielectric layer applied to a reflecting metal substrate
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Source
Translated from Inzhenerno-Fizicheskii Zhurnal; 67: Nos. 5-6, 489-492(Nov-Dec 1994).
Record Type
Journal Article
Literature Type
Translation
Journal
Journal of Engineering Physics and Thermophysics; ISSN 1062-0125;
; CODEN JEPTER; v. 67(5-6); p. 1118-1121

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