[en] In a closed vessel a cleaning solution is sprayed under pressure heated and recycled after filtration, each cleaning cycle is followed by a rinsing cycle also realized by spraying under pressure. Application is made for cleaning of sealing lining parts from compressors for UF₆

[en] A ''clean surface'' is one that contains no significant amounts of undesirable material. This paper discusses the types and origin of various contaminants. Since cleaning is often equated with adhesion, the mechanisms of adhesion to oxide, metal, and organic surfaces are reviewed and cleaning processes for these surfaces are outlined. Techniques for monitoring surface cleaning are presented, and the importance of storage of clean surfaces is discussed. An extensive bibliography is given. 4 figs., 89 references

[en] Process for the radioactive decontamination of a piece whereby a decontaminating gel is applied to the surface of this piece, this gel being then removed. This process provides a satisfactory decontamination of the surface of the piece without bringing about a deep change in the state of this surface and without leading to large quantities of radioactive effluents

[en] A windshield wiper with a transverse movement for cleaning all the surface of a shielding window isd claimed for a hot cell in nuclear industry. Mechanical specifications are given

[en] After testing of the fluid behavior of paste type cleansers, a system for application of these pastes in thin layers has been constructed. All materials used had been selected according to their compatibility against the chemical agents of the pastes. For application of molten salts to metal surfaces an induction heating system has been selected as heat source for heating the components to be decontaminated. A transportation system for the salt powders is tested. All components for practical demonstration of the decontamination methods with paste type cleansers and molten salt are ordered. (orig./RW)

[en] The Non Destructive Cleaning (NDC) process is truly a ''dry process'' that generates no secondary waste streams. Since no solid grit or aggregate is used, there is no need for bulk radioactive solid waste handling equipment. Moreover, since no chemicals are used, the mobile decontamination facility requires no radioactive chemical processing or mixed waste handling facilities. Instead the NDC process uses solid carbon dioxide particles propelled by dry compressed air as the cleaning medium. The carbon dioxide particles shatter upon impact with the surface of the material to be cleaned and flash into dry carbon dioxide gas. This flashing into gas results in a rapid volume expansion of about ten to one. The cleaning action is due to the rapidly expanding carbon dioxide gas flashing into the surface of the item to be cleaned (which is porous at the microscopic level) and flushing foreign materials out. The microscopic particles of foreign material are captured on high efficiency particulate filters. Larger sized fragments are lifted off the surface by the flashing carbon dioxide gas, fall to the bottom of the cleaning area and are vacuumed away to dry air filters. The NDC process also has the advantage that it does not attack the surface of the material being cleaned, making it unique among cleaning processes. (author)

[en] The apparatus includes 3 parts: a crusher feeded with dry ice blocks, a doser and an ejector placed in vector gas duct. A hood maintains the whole equipment in a CO² atmosphere. Application is made to decontamination of radioactive surfaces less radioactive effluents are produced

[en] This invention concerns a steam generator comprising a containment and U tubes, in which the heat is provided by a heating fluid flowing inside the tubes. It specifically concerns improved systems aiming at removing the sediment or deposits and to evacuate them. The use of steam generators of the containment and U tube type is routine practice, particularly so in the generation of steam for nuclear power-generation units

[en] The standard refers to the layout and construction of areas of clean conditions in the production workshops and on sites in order to maintain the surface cleanliness of components and systems. (orig.)

[en] This paper reports the causes of selectivity loss during tungsten (W) plug deposition investigated. It was determined that the major cause of selectivity loss was the presence of a sidewall contaminant formed during via etching. Photoresist removal procedures such as oxygen plasma ashing, or an organic stripping solution, did not fully remove this contaminant which supported W growth. Sidewall contaminants that remained on the surface after photoresist stripping resulted in the occurrence of via sidewall creep and W stringers. To completely remove sidewall contaminants after plasma ashing, it was necessary to use additional wet chemical cleaning procedures. This eliminated problems with sidewall creep and W stringers. However, it was also found that wet cleaning procedures could be the cause of other forms of selectivity loss such as W clusters and localized blankets of W metal, when not carefully implemented. The use of wet chemical cleaning procedures in combination with photoresist removal techniques was found to significantly reduce problems with selectivity loss, resulting in improved metallization yields