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AbstractAbstract
[en] Negative resist compositions are based on carbonaceous polymers with substituent branches containing epoxy groupings. Exemplary materials which include, for example, a copolymer of glycidyl methacrylate and ethyl acrylate in which epoxy groupings are unesterified show high sensitivity, for example, to electron radiation and to X-rays. Resolution is sufficient to permit expedient fabrication of detailed resist patterns for integrated circuits. High adherence permits use of acid or base reagents and thermal stability permits use of ion milling for circuit fabrication. (Auth.)
Original Title
Werkwijze voor het vormen van door hoge energiestraling hardbare reservelagen alsmede voorwerpen die deze lagen omvatten
Source
5 Aug 1977; 31 p; NL PATENT DOCUMENT 7708693/A/; Priority 6 Aug 1976, US; 3 figs.
Record Type
Patent
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