[en] TaN/sub x/ films have been prepared by reactive sputtering at substrate temperatures of 20, 250, 500, and 750 ⁰C. The structure of the films has been studied by x-ray diffraction. The nitrogen portion of the compound has been determined by the nuclear reaction ¹⁴N(d,α)¹²C, whereas the amount of tantalum has been measured by Rutherford ion backscattering. Depending on the preparation conditions, superconductivity transition temperatures up to 10.8 ⁰K have been observed. The ratio Ta/N of the superconducting films has been found to be between 0.9 and 1.1 and will be attributed to the fcc TaN phase