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[en] A long-lifetime heavy ion source with indirect heating was constructed for an implanter. The ion current produced by the source is 1-2 mA. The indirect heating enables the stabilization of the discharge working in the arc region. The emittance was measured in the xz and yz planes at 30 kV extraction voltage. The beam is practically parallel in the y plane and slightly diverging in the x plane. The source was working more than 100 hours without any change in the emission or in other parameters. (D.P.)
Source
Nov 1977; 11 p; ISBN 963 371 342 0; 
; 9 figs.; 5 refs.
; 9 figs.; 5 refs.