[en] A duopigatron ion source is modified by replacing the normal oxide-coated wire filament cathode of the ion source with a hot tungsten oven through which hydrogen gas is fed into the arc chamber. The hydrogen gas is predissociated in the hot oven prior to the arc discharge, and the recombination rate is minimized by hot walls inside of the arc chamber. With the use of the above modifications, the atomic H₁ + ion fraction output can be increased from the normal 50% to greater than 70% with a corresponding decrease in the H₂ + and H₃ + molecular ion fraction outputs from the ion source