[en] According to specifications written for the 25 MV ORNL tandem accelerator, the ion source used during acceptance testing must be capable of producing a negative ion beam of intensity greater than or equal to 7.5 μA within a phase space of less than or equal to 1 π cm-mrad (MeV)/sup 1/2/. The specifications were written prior to the development of an ion source with such capabilities but fortunately Andersen and Tykesson introduced a source in 1975 which could easily meet the specified requirements. The remarkable beam intensity and quality properties of this source has motivated the development of other sources which utilize sputtering in the presence of a diffuse cesium plasma - some of which will be described in these proceedings. This report describes results of studies associated with the development of a modified Aarhus geometry and an axial geometry source which utilize sputtering in the presence of a diffuse cesium plasma for the production of negative ion beams