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AbstractAbstract
[en] The influence of radiation from a gas-plasma source of low energy argon ions (<= 3 keV) on LiF microhardness has been studied. Mixed corpuscular-wave radiation of argon discharge has been shown to increase LiF microhardness in the surface layer approximately 40 μ thick. The effect is caused by the influence of the ultraviolet component in the discharge. The contribution from the ion component is small reducing the sputtering of crystal surface. A correlation has been found between the value of surface layer hardening resulting in the growth of microhardness, and the density of F-centres in the surface layers
[ru]
Original Title
Izmenenie mikrotverdosti LiF pri odnovremennom vozdejstvii nizkoehnergeticheskikh ionov i vakuumnogo ul'trafioleta
Primary Subject
Record Type
Journal Article
Journal
Latvijas PSR Zinatnu Akademijas Vestis, Fizikas un Tehnisko Zinatnu Serija; (no.5); p. 23-29
Country of publication
ALKALI METAL COMPOUNDS, BEAMS, CHARGED PARTICLES, COLOR CENTERS, CRYSTAL DEFECTS, CRYSTAL STRUCTURE, ELECTROMAGNETIC RADIATION, ENERGY RANGE, FLUORIDES, FLUORINE COMPOUNDS, HALIDES, HALOGEN COMPOUNDS, HARDENING, HARDNESS, IONS, KEV RANGE, LITHIUM COMPOUNDS, MECHANICAL PROPERTIES, PHYSICAL RADIATION EFFECTS, POINT DEFECTS, RADIATION EFFECTS, RADIATIONS, ULTRAVIOLET RADIATION, VACANCIES
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