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AbstractAbstract
[en] The rate of the reaction of CH3 and H has been measured at 300 K over the pressure range 50-1000 Torr with Ar and SF6 as diluent gases. Flash photolysis of azomethane/ethylene mixtures was employed, coupled with gas chromatographic analysis and numerical simulation of the product yields. The rate data were compared with a RRKM analysis, using a minimum density of states criterion for locating the activated complex. The limiting high pressure rate constant so obtained is (1.5 +- 0.7) x 10-10 cm3 molecule-1s-1. The RRKM model was found to give high temperature, high pressure rate constants for the dissociation of CH4 which are significantly higher than those found experimentally. (orig.)
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Record Type
Journal Article
Journal
Chemical Physics; ISSN 0301-0104;
; v. 53(3); p. 279-291

Country of publication
ARGON, ARRHENIUS EQUATION, AZO COMPOUNDS, CHEMICAL REACTION KINETICS, CHEMICAL REACTION YIELD, DISSOCIATION, ENERGY LEVELS, ETHYLENE, GAS CHROMATOGRAPHY, HYDROGEN, LOW PRESSURE, MEDIUM PRESSURE, METHANE, METHYL RADICALS, MORSE POTENTIAL, OSCILLATION MODES, PHOTOLYSIS, PRESSURE DEPENDENCE, SULFUR FLUORIDES, TEMPERATURE DEPENDENCE, VERY HIGH TEMPERATURE
ALKANES, ALKENES, ALKYL RADICALS, CHEMICAL REACTIONS, CHROMATOGRAPHY, DECOMPOSITION, ELEMENTS, FLUORIDES, FLUORINE COMPOUNDS, HALIDES, HALOGEN COMPOUNDS, HYDROCARBONS, KINETICS, NONMETALS, ORGANIC COMPOUNDS, ORGANIC NITROGEN COMPOUNDS, RADICALS, RARE GASES, REACTION KINETICS, SEPARATION PROCESSES, SULFUR COMPOUNDS
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