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McHargue, C.J.; Sklad, P.S.; Angelini, P.; Lewis, M.B.
Oak Ridge National Lab., TN (USA)1983
Oak Ridge National Lab., TN (USA)1983
AbstractAbstract
[en] Polycrystalline samples of TiB2 were implanted at ambient temperatures with 1-MeV Ni+ ions to a fluence of 1 x 1017 ions/cm2. This fluence corresponds to a calculated nickel-to-titanium ratio, within the half width of the ion distribution, of approximately 0.12. Analytical electron microscopy was used to study the resultant microstructure. The starting microstructure was modified to a depth of approximately 750 nm, significantly deeper than the calculated peak in the deposited nickel profile of 389 nm. The results also show a change in the character of the microstructure, from one exhibiting a moderate density of tangled dislocations to a high density of small defects, as well as a change in the concentration of nickel as a function of depth from the implanted surface. There was no evidence of nickel precipitation. Surface mechanical properties such as hardness and wear resistance were significantly increased
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1983; 22 p; 2. international conference on radiation effects in insulators; Albuquerque, NM (USA); 30 May - 3 Jun 1983; Available from NTIS, PC A02/MF A01 as DE83014020
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