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Larson, B.C.; Noggle, T.S.; Barhorst, J.F.
Oak Ridge National Lab., TN (USA); Emerson Electric Co., St. Charles, MO (USA)1985
Oak Ridge National Lab., TN (USA); Emerson Electric Co., St. Charles, MO (USA)1985
AbstractAbstract
[en] X-ray diffuse scattering has been used to study the thermal annealing of vacancy and interstitial loops in Ni-ion irradiated copper. The diffuse scattering formalism is reviewed and diffuse scattering measurements are reported on liquid-He temperature Ni-ion irradiated copper after annealing to 40, 275, and 3000C. Size distributions are presented for vacancy and interstitial loops after each anneal and the thermal-induced changes are discussed in terms of loop dissolution and coalescence
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Jan 1985; 7 p; Materials Research Society annual meeting; Boston, MA (USA); 26-29 Nov 1984; Available from NTIS, PC A02/MF A01 as DE86002272
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