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Sella, C.; Heindl, R.; Robert, A.
CEA Centre d'Etudes Nucleaires de Fontenay-aux-Roses, 92 (France). Inst. de Recherche Technologique et de Developpement Industriel (IRDI)1985
CEA Centre d'Etudes Nucleaires de Fontenay-aux-Roses, 92 (France). Inst. de Recherche Technologique et de Developpement Industriel (IRDI)1985
AbstractAbstract
[en] We have developed a new selective scintillator based on the use of Ce3+ doped glass layer with thicknesses ranging from 10 to 40 μm. These films are deposited by RF reactive sputtering on the entry window of a photomultiplier. Characteristics are presented. Their selectivity of alpha particles is illustrated. These new thin film scintillators can be used to measure alpha emitters in solution
Source
Jun 1985; 5 p; 5. International colloquium on plasmas and cathodic sputtering; Antibes (France); 10-14 Jun 1985
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Conference
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