[en] High dose ⁵⁶Fe implantations (15-110 keV) in oxygen ion conducting solid solutions of 0.86 ZrO₂-0.14 YOsub(1.5) [ZY14] are used to introduce electronic conductivity. The Fe distribution in the target as a function of the various implantation parameters has been studied. Different profile shapes can be obtained. Strong deviations from the normally expected Gaussian distribution are found after high dose implantation due to sputtering effects. The peak concentration of high dose distributions is situated at or close to the surface. A maximum surface concentration with respect to Zr(Fe/Zr=1.0) is achieved with the highest implantation energy used (110 keV) because the sputter yield is relatively low as compared with lower energies. After prolonged heat treatment in air (800⁰C,24-60 hours) of the samples implanted with a high dose Fe, Fe₂O₃-rich surface layers are formed. Rutherford Backscattering Spectometry is used for the profile analyses in combination with the Auger Electron Spectroscopy. (author)