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[en] The erosion of surfaces due to the interaction of particles (inert or reactive ions/atoms, electrons) and electromagnetic radiation with materials and the deposition of films on different substrates have become subjects of major interest, and therefore the object of extensive studies, as a consequence of the relevance of erosion and deposition processes in different technologies. The author presents a review of the etching/deposition processes and their technological applications. (Auth.)
Source
Kiriakidis, G. (Crete Univ., Heraklion (Greece). Physics Department); Carter, G. (Salford Univ. (UK). Dept. of Electronic and Electrical Engineering); Whitton, J.L. (Queen's Univ., Kingston, Ontario (Canada). Dept. of Physics) (eds.); NATO ASI Series; (no.112); 476 p; ISBN 90-247-3358-8; 
; 1986; p. 394-422; Martinus Nijhoff; Dordrecht (Netherlands); NATO Advanced Study Institute on erosion and growth of solids stimulated by atom and ion beams; Heraklion, Crete (Greece); 16-27 Sep 1985; 93 refs.
; 1986; p. 394-422; Martinus Nijhoff; Dordrecht (Netherlands); NATO Advanced Study Institute on erosion and growth of solids stimulated by atom and ion beams; Heraklion, Crete (Greece); 16-27 Sep 1985; 93 refs.