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[en] The present paper informs about thermodynamic calculations of the B-Cl-H system, carried out irrespective of data, already published by other authors. It further deals with recent experimental results on silicon doping with boron in the presence of hydrogen chloride, the layer growth rate being varied. Finally, the possibility of quantitatively interpreting the suppressing influence of hydrogen chloride on the doping of silicon with boron is discussed. (author)
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