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AbstractAbstract
[en] Lithography is a process for formation of two dimensional patterns. In modern electronic technology the fabrication of an integrated circuit may involve a sequence of perhaps a dozen two dimensional patterns precisely registered to one another. Each pattern in the sequence defines the regions in which the next processing step in the IC fabrication procedure is to be applied. Currently, lithography is almost entirely photolithography. The author discusses the possible uses of ion beams in microlithography: exposure of organic resists; broad ion beams and parallel processing; focused beams and serial processing; and applications of finely focused ion beams in microelectronics. (Auth.)
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Kiriakidis, G. (Crete Univ., Heraklion (Greece). Physics Department); Carter, G. (Salford Univ. (UK). Dept. of Electronic and Electrical Engineering); Whitton, J.L. (Queen's Univ., Kingston, Ontario (Canada). Dept. of Physics) (eds.); NATO ASI Series; (no.112); 476 p; ISBN 90-247-3358-8;
; 1986; p. 338-365; Martinus Nijhoff; Dordrecht (Netherlands); NATO Advanced Study Institute on erosion and growth of solids stimulated by atom and ion beams; Heraklion, Crete (Greece); 16-27 Sep 1985; 49 refs.

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