[en] The ability to quickly and accurately characterize arbitrary multilayers is very valuable for not only can we use the characterizations to predict the reflectivity of a multilayer for any soft x-ray wavelength, we also can generalize the results to apply to other multilayers of the same type. In addition, we can use the characterizations as a means of evaluating various sputtering environments and refining sputtering techniques to obtain better multilayers. In this report we have obtained improved characterizations for sample molybdenum-silicon and vanadium-silicon multilayers. However, we only examined five crystals overall, so the conclusions that we could draw about the structure of general multilayers is limited. Research involving many multilayers manufactured under the same sputtering conditions is clearly in order. In order to best understand multilayer structures it may be necessary to further refine our model, e.g., adopting a Gaussian form for the interface regions. With such improvements we can expect even better agreement with experimental values and continued concurrence with other characterization techniques. 18 refs., 30 figs., 7 tabs