[en] Fortunately, surface treatment for s.c. cavities knows only one simple rule. If one observes this rule strictly one will be successful, if not, one will fail! The rule is CLEANLINESS. This means: clean material (high purity niobium without inclusions), clean (analytical grade) polishing chemicals and solvents, ultraclean (semiconductor grade) rinsing water, ultraclean (class 100) assembly environment. In general, if one applies the same working practice as the semiconductor industry, one will produce surfaces that are less clean than silicon wafers, due to the shape of the cavity (an inner surface is much more difficult to clean than a flat wafer); due to its size and due to the material (niobium is hydrophilic which makes the water with all the dirt in it stick to the surface). 9 references