[en] Consideration is given to results of complex studies of the effect of implanted fluorine ion dose on crystal and magnetic microstructure of near-the-surface layers of ferrite garnet films of Y_1.76Lu_0.25Sm_0.17Ca_0.78Pb_0.04 x Fe_4.24Ge_0.76O₁₂ composition. Implantation was conducted by 95 keV fluorine ions within dose range of 2x10¹⁴-1x10¹⁵ cm^-2. It is shown that fluorine during ion implantation loses energy in collisions with target atoms, forming defect cascade and doping profile, similar to one, obtained in experiments. The maximum of fluorine concentration is observed near the surface, that is in the region of strong of strong radiation damages