[en] In the present article, structure phase transformations in thin iron films successively irradiated by nitrogen and boron ions and then annealed in vacuum were investigated by transmission electron microscopy (TEM). As a result of the experiments, it was found that during successive implantation some types of phase composition Fe₃B, Fe₃B + ε-Fe_2+x, ε-Fe_2+xN or ε-Fe_2+xN+FeB, depending on the irradiation nitrogen and boron doses, were formed. Successive implantation leads to an increase of the temperature range of the phase existence ε-Fe_2+xN in comparison with single implantation by N⁺ ions from 450degC to 600degC. During annealing at more than 80degC boron phases FeB are transformed into Fe₂B, and Fe₃B phases at T>400degC are transformed into Fe₂B. The change of the relative value of electrical resistance (R/R₀) of Fe films after implantation and in the process of isochronal annealing is determined by structure and phase transformations. (orig.)