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AbstractAbstract
[en] Amorphous polyethersulfone (PES) films have been implanted with a variety of ions (He, B, C, N and As) at a bombarding energy of 50 keV in the dose range 1016-1017 ions/cm2. Surface resistance as a function of dose indicates a saturation effect with a significant difference between He and the other ions used. ESR line shapes in the He implanted samples changed from a mixed Gaussian/Lorentzian to a pure Lorentzian and narrowed with increasing dose. Temperature dependent resistivity indicates an electron hopping mechanism for conduction. Infrared results indicate cross-linking or self-cyclization occurred for all implanted ions with further destruction in the case of As. (orig.)
Primary Subject
Source
7. international conference on ion beam modification of materials (IBMM-7) and exposition; Knoxville, TN (United States); 9-14 Sep 1990
Record Type
Journal Article
Literature Type
Conference
Journal
Nuclear Instruments and Methods in Physics Research, Section B; ISSN 0168-583X;
; CODEN NIMBE; v. 59/60(pt.2); p. 1240-1244

Country of publication
AMORPHOUS STATE, ANNEALING, ARSENIC IONS, BORON IONS, CARBON IONS, CROSS-LINKING, ELECTRIC CONDUCTIVITY, ELECTRON SPIN RESONANCE, ETHERS, FILMS, HELIUM IONS, INFRARED SPECTRA, ION IMPLANTATION, KEV RANGE 10-100, NITROGEN IONS, ORGANIC POLYMERS, PHYSICAL RADIATION EFFECTS, RADIATION DOSES, SULFONES, TEMPERATURE DEPENDENCE
Reference NumberReference Number
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