[en] The nanometer-size crystalline Ti film have been manufactured by using of a sputtering deposition utilising Electron Cyclotron Resonance (ECR) plasma at room temperature. The substrates are quartz glass, NaCl monocrystal and pure Al. Thee structure and the composition of the Ti films have been determined by using XRD, TEM, XPS. The results show that the size d < 10 nm, and with a stable abnormal fcc structure. The influence of working parameters on the crystal structure, the grain size, deposition rate and adhesion of the films have been studied systematically. The mechanism of depositing Ti films have been discussed