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[en] Laser-produced plasmas are investigated as a source for soft x-ray projection lithography. The dependence of conversion efficiency on target material, intensity, wavelength, and pulse width is determined using absolutely calibrated detectors. Conversion efficiency greater than 1% into a 2.2 eV bandwidth is demonstrated for Sn targets, fulfilling the system source requirements
Journal
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; ISSN 0734-211X; 
; CODEN JVTBD9; v. 11(6); p. 2986-2989
; CODEN JVTBD9; v. 11(6); p. 2986-2989