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AbstractAbstract
[en] Using the flowing afterglow Langmuir probe (FALP) technique, dissociative attachment coefficients β for reactions of electrons with gas phase superacids HCo(PF3)4, HRh(PF3)4 and carbonyl hydride complexes HMn(CO)5, HRe(CO)5 have been determined under thermal conditions over the approximate temperature range 300∼550 K. The superacids react relatively slowly (<1/20 of βmax) with free electrons in a thermal plasma, and the values of β obtained this far do not show a correlation between acidity and β. The pioneer researchers in this field had speculated that any superacid would be a rapid attacher of electrons; it was found that this speculation is not true in general. The product distribution of electron attachment reaction to HCo(PF3)4 was found to be independent of temperature even though the β[HCo(PF3)4] increases with temperature. This proposes that the electron attachment process occurs well before the excited complex dissociates. In addition, the activation energy of HCo(PF3)4 for electron attachment has been derived from the Arrhenius plots. The carbonyl hydride complexes, HMn(CO)5 and HRe(CO)5, react relatively rapidly (>1/4 of βmax) with free electrons in thermal plasma. This indicates that these reactions cannot be significantly endothermic. Observation of rapid attachment for these non-superacids shows that the Mn-CO and Re-CO bonds are weaker than the Mn-H and Re-H bonds, respectively. Comparisons between the carbonyl and trifluorophosphine cases implies that fast electron capture is related more to the CO ligand than to the transition-metal species
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Source
1992; 139 p; The Univ. of Oklahoma; Norman, OK (United States); Available from University Microfilms, P.O. Box 1764, Ann Arbor, MI 48106 (United States). Order No. 93-059,59; Thesis (Ph.D.).
Record Type
Miscellaneous
Literature Type
Thesis/Dissertation
Country of publication
ACTIVATION ENERGY, CARBONYLS, CHEMICAL REACTION KINETICS, COBALT COMPOUNDS, ELECTRON ATTACHMENT, ELECTRON CAPTURE, HYDRIDES, INORGANIC ACIDS, LANGMUIR PROBE, PHOSPHORUS FLUORIDES, PLASMA, RHENIUM COMPOUNDS, RHODIUM COMPOUNDS, TEMPERATURE DEPENDENCE, TEMPERATURE RANGE 0273-0400 K, TEMPERATURE RANGE 0400-1000 K
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