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Kung, H.; Fayeulle, S.; Nastasi, M.; Lu, Y.C.
Los Alamos National Lab., NM (United States). Funding organisation: USDOE Assistant Secretary for Human Resources and Administration, Washington, DC (United States)1997
Los Alamos National Lab., NM (United States). Funding organisation: USDOE Assistant Secretary for Human Resources and Administration, Washington, DC (United States)1997
AbstractAbstract
[en] The effects of Ar ion irradiation on the structure and stability of multilayered DC sputtered thin films of TiN/B-C-N have been studied. An increase of the bilayer repeat length to a maximum of 12.8% and departure of nitrogen from the film was observed indicating the interdiffusion between TiN and B-C-N layers. For the highest dose (5 x 1016 ions/cm2) the multilayered structure partly disappears. The various mechanisms are discussed in terms of stress-driven diffusion and viscous flow of atoms
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1997; 9 p; International conference on materials and process characterization for VSLI; Shanghai (China); 4-7 Nov 1997; CONF-971132--; CONTRACT W-7405-ENG-36; ALSO AVAILABLE FROM OSTI AS DE97008333; NTIS; US GOVT. PRINTING OFFICE DEP
Record Type
Report
Literature Type
Conference; Numerical Data
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