[en] Different single layers and multilayer coatings deposited by e-beam evaporation and r.f. sputtering techniques have been characterised by the Phase Modulated Spectroscopic Ellipsometer, installed recently in the Spectroscopy Division, B.A.R.C. The Phase Modulated technique provides a faster and more accurate data acquisition process than the conventional ellipsometry. Measurements have been done on single layers of Cu, Si and ZrO₂ films and on multilayer thin films devices e.g., high reflectivity mirror, beam combiner, beam splitter, narrow band filter etc. consisting of several bilayers of TiO₂/SiO₂. The measured Ellipsometry spectra is then fitted with a theoretical spectra generated assuming an appropriate model regarding the sample. The layer thickness and composition have been used as fitting parameters. The optical constants of the substrates have been supplied and a trial dispersion relation have been used for the layers. In case of inhomogeneous layers, trial compositions have been given for the individual components for each layer. The roughness of the layers has been taken into account by assuming the film to be an inhomogeneous mixture of material and voids. The fittings have been done objectively by minimising the squared difference (χ²) between the measured and calculated values of the ellipsometric parameters and thus accurate information have been derived regarding the thickness and optical constants (viz, the refractive index and extinction coefficient) of the different layers, the surface roughness and the inhomogeneities present in the layers. (author)