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Sickafus, Kurt E.; Wetteland, Christopher J.; Baker, Neil P.; Yu, Ning; Devanathan, Ram; Nastasi, Michael; Bordes, Nicole
Los Alamos National Lab., NM (United States). Materials Science and Technology Div. Funding organisation: USDOE Assistant Secretary for Human Resources and Administration, Washington, DC (United States)1997
Los Alamos National Lab., NM (United States). Materials Science and Technology Div. Funding organisation: USDOE Assistant Secretary for Human Resources and Administration, Washington, DC (United States)1997
AbstractAbstract
[en] The mechanical properties of Xe-implanted spinel and cubic zirconia surfaces, as determined by nano-indentation measurements, are distinct and the differences can be related to their microstructures. Upon Xe(2+) ion irradiation at cryogenic temperature (120K), the Young's modulus of irradiated spinel increases slightly (a few percent) then falls dramatically until the modulus is only about 3/4 the unirradiated value. The maximum modulus occurs concurrent with the formation of a metastable crystalline phase of spinel. The subsequent elastic softening at higher Xe(2+) doses is an indication of the onset of amorphization of the spinel. Xe-implanted zirconia surfaces behaves differently, in all cases showing almost no change in elastic modulus with increasing Xe(2+) ion dose. This is consistent with microstructural observations of Xe-implanted zirconia crystals which, unlike spinel, show no change in crystal structure with increasing ion dose. The defected layer in zirconia due to ion damage simply thickens with increasing Xe(2+) dose. This thickening may be a consequence of compressive stresses that form in the ion- implanted surface region. The hardness of both spinel and zirconia increases slightly for low Xe(2+) ion doses. At higher doses, zirconia shows little change in hardness, while the hardness of the implanted spinel falls by more than a factor of two. The initial increase in hardness of both spinel and zirconia is probably due to point defect accumulation and the precipitation of small interstitial clusters, while the drop in hardness of spinel at high Xe(2+) ion doses is due to the formation of an amorphous phase
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May 1997; 27 p; Modification of ceramics and semiconductors by ion beams conference; Ciocco (Italy); 17-23 May 1997; CONF-9705230--; CONTRACT W-7405-ENG-36; ALSO AVAILABLE FROM OSTI AS DE98003018; NTIS; INIS; US GOVT. PRINTING OFFICE DEP
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