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Chunyu Shutai; Gu Yuqiu; You Yonglu; Huang Wenzhong; He Yingling; Ma Yueying; Pei Shu; Cao Jianlin
China Nuclear Information Centre, Beijing (China)1999
China Nuclear Information Centre, Beijing (China)1999
AbstractAbstract
[en] Especially for the applications of X-ray lasers, X-ray multi-layer reflector is an important element for soft X-ray optics. With developing of the X-ray lasers and its applications, the uses of the X-ray multi-layer reflector become more wide-ranging. But the plasma environment which creates X-ray laser brings the difficulties to the application of X-ray multi-layer reflector. The biggest difficulty is that the X-ray emitted by the plasma destroys and damages the multi-layer reflector. It is shown by the experiments that the damage threshold of Mo/Si multi-layer reflector made in China is less than 0.10 J/cm2. Under the exposure to this radiation dose, the root-mean square roughness of multi-layer apparently increases and the reflectivity almost drops to zero. According to these results, the authors give some ideas for preventing damages of the multi-layer reflector
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Aug 1999; 15 p; CAEP--0026; ISBN 7-5022-2055-0;
; 3 tabs., 5 figs., 9 refs.

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