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Pahlke, S.; Fabry, L.; Kotz, L.; Mantler, C.; Ehmann, T.
8. conference on total reflection x-ray fluorescence analysis and related methods2000
8. conference on total reflection x-ray fluorescence analysis and related methods2000
AbstractAbstract
[en] Recently, TXRF became a standard, on-line inspection tool for controlling the cleanliness of polished Si wafers for semiconductor use now up to 300 diameter. Wafer makers strive for an all-over metallic cleanliness of < 1010 atoms x cm-2. Therefore an analytical tools must cover LOD in a range < 109 atoms x cm-2 or lower. The all-over cleanliness of the whole wafer surface can analyzed using VPD/TXRF. For this chemical wafer-pre-preparation under cleanroom conditions class 1 we have developed a full automatic 'Wafer Surface Preparation System' coupled with a new generation TXRF. We have also combined this system with other independent methods for Na, Al, anions and cations. Only the combination of automatic wafer handling systems, modem analytical tools, ultra-pure water, ULSI chemicals and special cleanroom conditions provides us a chance to achieve the present and the future demands for semiconductor industry. (author)
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Wobrauschek, P. (ed.) (Atominstitut, Stadionallee 2, 1020 Vienna (Austria)); Atominstitut der oesterreichischen Universitaeten, Technische Universitaet Wien, Stadionallee 2, 1020 Vienna (Austria). Funding organisation: Amptek Inc. 6, De Angelo Drive, Bedford (United States); Atomika, Atomika Instruments GmbH, Bruckmannring 40, D-85764 Oberschleissheim (Germany); Brau AG (Austria); Coca-Cola Beverages Austria (Austria); Creditanstalt (Austria); Intax, Schwarzschildstrasse 10, D-1248 Ital Structures (Germany); Pfeiffer Vacuum Austria, Diefenbachgasse 35, A-1150 Wien (Austria); Philips Analytical, Lelyweg 1, 7602 EA Almelo (Netherlands); Stadt Wien, Vienna (Austria); Technos (Japan); TU Wien, Vienna (Austria); et al; 108 p; 2000; p. 40; 8. conference on total reflection x-ray fluorescence analysis and related methods; Vienna (Austria); 25-29 Sep 2000; Available in abstract form only, full text entered in this record. Also available from Atominstitut der oesterreichischen Universitaeten, Technische Universitaet Wien, Stadionallee 2, 1020 Vienna (AT). e-mail: wobi@ati.ac.at
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Conference
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