[en] since the early 1970's, semiconductor manufacturers considered using research reactor thermal neutrons to dope silicon with phosphorus. the method can result in a product with an inhomogeneity of 5% or less compared with conventional methods where the homogeneity fluctuated by a factor of about tow across the crystal. the greatly improved method of doping has resulted in a growing number of research reactor facilities engaged in commercial production of doped silicon. one of the very promising facilities of the ETRR-2 is the neutron transmutation - doping (NTD) unit, which is currently under commissioning. this work is done to optimize the performance of the ETRR-2 NTD facility based on the standard sand to develop a calculation line to be followed during its commercial operating phase. first, a review of the neutron transmutation doping techniques and description of the facilities around the world presented together with a description of the ETRR-2 facility