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Pershenkov, V.S.; Cherepko, S.V.; Maslov, V.B.; Belyakov, V.V.; Sogoyan, A.V.; Ulimov, N.; Emelianov, V.V.
CEA Grenoble, Lab. d'Electronique et de Technologie de l'Informatique, LETI, 38 (France)1999
CEA Grenoble, Lab. d'Electronique et de Technologie de l'Informatique, LETI, 38 (France)1999
AbstractAbstract
[en] Low dose rate effect in bipolar devices consists in the increase of peripheral surface recombination current with dose rate decrease. This is due to the more rapid positive oxide charge and interface trap density build-up as the dose rate becomes lower. High dose rate elevated temperature irradiation is proposed for simulation if the low dose rate effect. In the present we tried to separate the effect of radiation-induced charge in the thick passivation oxide over the emitter junction and passive base regions of npn bipolar transistor. Its goal is to improve bipolar device design for use in space environments and nuclear installations. Three experiments were made during this work. 1. Experiment on radiation-induced charge neutralization (RICN) effect under elevated temperature was performed to show transistor degradation dependence on emitter-base bias. 2. High dose rate elevated and room temperature irradiation of bipolar transistors were performed to separate effects of emitter-junction and passive base regions. 3. Pre- and post- irradiation hydrogen ambient storage was used to investigate its effect on radiation-induced charge build-up over the passive base region. All experiments were performed with npn and pnp transistors. (authors)
Original Title
Influence de la jonction d'emetteur et de la region de base passive sur l'effet du debit de dose dans les dispositifs bipolaires
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1999; [4 p.]; 5. European conference on radiation and its effects on components and systems; 5. congres europeen les radiations et leurs effets sur les composants et les systemes; Abbaye de Fontevraud (France); 13-17 Sep 1999; 9 refs.
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